| Electroless Nickel plating is a process that deposits nickel on a surface without electric current.
Electroless nickel plating is accomplished using a controlled chemical reaction instead of external
electrical current to deposit the nickel coating. Another term for electroless nickel plating is
autocatalytic nickel plating because there is a catalyst present that allows the reaction to occur.
Nickel and phosphorous electroless nickel baths contain constituants such as nickel ions,
hypophosphite, buffers, and complexing agents. The nickel ions combine with phosphorous during the
plating process to form the nickel deposit. The hypophosphite is the reducing agent that is the catalyst
for chemical reduction of nickel ions. Buffers maintain the pH of the bath, and complexing agents maintain
the nickel ions in soluble form. In addition, they both stabilize the bath and help maintain a steady
plating rate. The chemical reaction for a typical Nickel Phosphorous plating process is:
NiSO4 + 2NaH2PO2 + 2H2O + buffers, complexing agents -------->
Ni + 2NaH2PO3- + H2 + H2SO4
The main feature of electroless plating as compared to electroplating is distribution of the plating on
the surface of the part. Electroplating relies on current density. The electrical current must be distributed
across the surface as evenly as possible. Sharp edges, recesses, holes, threads or other such features will
not plate evenly. Through chemical oxidation and reduction reactions an even uniform coating is deposited
on a variety of surfaces. There is no edge build-up as with electroplating.
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